C Series CVD/CVI System Technical Overview
C Series CVD/CVI System is a HAOYUE c series cvd/cvi system solution for CVD/CVI processing. It is designed for demanding research, pilot-scale testing and industrial production where stable temperature, vacuum, pressure, atmosphere control and process repeatability are required.
C Series CVD/CVI System Applications
- chemical vapor deposition and infiltration
- carbon-carbon and ceramic matrix composite processing
- controlled gas flow, vacuum and recipe-based coating work
C Series CVD/CVI System Configuration Options
- Chamber size, usable hot zone, loading method and fixture design
- Working temperature, vacuum level, pressure, atmosphere and cooling method
- Graphite, molybdenum, tungsten or customized hot zone configuration
- PLC control, recipe management, data recording and safety interlock options
Related HAOYUE Furnace Systems
- P7H Vacuum Hot Pressing Furnace
- P7V Vacuum Hot Pressing Furnace
- P7V Two-Chamber Vacuum Hot Pressing Furnace
Send material type, part size, target temperature, pressure or atmosphere requirement and production capacity. Contact HAOYUE engineers to request a technical proposal for the c series cvd/cvi system.
🧩 Product Overview
The C Series CVD/CVI System is an advanced thermal processing system designed for chemical vapor Deposition (CVD) and chemical vapor infiltration (CVI) of high-performance materials.
This system enables:
- Surface coating (CVD)
- Internal structure densification (CVI)
👉 Widely used for:
- Semiconductor materials
- Advanced ceramics
- Carbon-based composites
CVD technology enables high-purity coating formation, while CVI allows gas-phase infiltration into porous structures to form dense composite materials
🔬 CVD vs CVI (Core Technology Understanding)
✔ Chemical Vapor Deposition (CVD)
- Deposits thin films on material surfaces
- Coating thickness:
- From nanometers to hundreds of microns
👉 Typical materials:
- Silicon carbide (SiC)
- Pyrolytic carbon
- Boron nitride
✔ Chemical Vapor Infiltration (CVI)
- Gas penetrates porous materials
- Deposits material internally
👉 Result:
- Improved mechanical strength
- Enhanced heat resistance
- Lower residual stress
⚙️ Core Applications
This CVD/CVI system is widely used in:
- Ceramic matrix composites (CMC)
- Carbon-carbon composites
- Semiconductor substrates
- High-temperature structural materials
👉 Typical applications:
- Epitaxial wafer substrates
- Semiconductor crucibles
- Hot bending molds
- Aerospace components
⭐ Key Features & Advantages
✔ High Equipment Stability
- Designed for long-term continuous operation
- Low maintenance requirements
✔ Excellent Temperature Uniformity
- Temperature uniformity: ±5°C
- Multi-channel gas flow ensures uniform Deposition
✔ High Process Control Accuracy
- Precise control of:
- Gas flow
- Pressure
- Deposition environment
👉 Ensures stable coating quality
✔ Advanced Gas Flow Design
- Multi-channel gas path
- Uniform flow field without dead zones
👉 Ensures consistent Deposition results
✔ Fully Enclosed Deposition Chamber
- Strong sealing performance
- Anti-contamination design
✔ High Safety Performance
- PLC + HMI + PID control system
- Pressure sensing and safety control
✔ Exhaust Gas Treatment System
- Multi-stage treatment for:
- Corrosive gases
- Flammable gases
- Dust and by-products
👉 Environmentally friendly and safe
✔ Corrosion-Resistant Vacuum System
- Long continuous working time
- Extremely low maintenance rate
✔ Vertical Structure Design
- Top/bottom opening structure
- High loading accuracy
- Easy operation
📊 Technical Specifications (Strictly Based on Product Data)
Typical Models
| Model | Chamber Size | Ultimate Vacuum | Max Temperature | Application |
|---|---|---|---|---|
| C4VGR16 | Φ500 × 600 mm | 1 Pa | 1600°C | CVD/CVI |
| C6VGR16 | Φ800 × 900 mm | 1 Pa | 1600°C | CVD/CVI |
| C7VGR16 | Φ1000 × 1000 mm | 1 Pa | 1600°C | CVD/CVI |
| C8VGR16 | Φ1100 × 1200 mm | 1 Pa | 1600°C | CVD/CVI |
📌 All specifications strictly aligned with official product data
🏭 Application Fields
This system is ideal for:
- Semiconductor industry
- Aerospace materials
- Advanced ceramics manufacturing
- Carbon composite production
👉 Especially suitable for:
- SiC coating
- Carbon coating
- BN coating
- Composite densification
🚀 Why Choose C Series CVD/CVI System?
👉 Best for Surface Coating (CVD)
- High purity thin film Deposition
👉 Best for Composite Materials (CVI)
- Internal densification of porous materials
👉 Best for High-End Applications
- Semiconductor
- Aerospace
- Advanced materials
⚖️ Position in Product Portfolio
| Series | Function |
|---|---|
| V Series | Vacuum heat treatment |
| P Series | Hot pressing sintering |
| S Series | SPS sintering |
| C Series (This Product) | CVD / CVI Deposition & infiltration |
👉 Key difference:
- P / SPS → Densification via pressure & temperature
- C Series → Material growth via gas-phase reaction
🧩 Customization Options
- Chamber size customization
- Gas system configuration
- Process control upgrade
- Exhaust treatment system upgrade
🎯 Why Choose Us?
- Professional CVD/CVI system manufacturer
- Strong expertise in advanced material processing
- Complete solution for coating and composite densification
- Reliable technical support and service
📩 Get a Quote
Looking for a reliable CVD/CVI furnace manufacturer?
Contact us today for customized solutions and quotation.
Ava S. –
The C Series CVD/CVI System sets the industry standard for efficiency and performance. It is a reliable and versatile system that has upgraded our production process.
Carlos T. –
I am very satisfied with the performance of the C Series CVD/CVI System. It has been a valuable addition to our semiconductor materials production.
Sophia L. –
The precision and control offered by the C Series CVD/CVI System are exceptional. We have achieved consistent and high-quality results with this furnace.
Liam H. –
Overall, the C Series CVD/CVI System delivers good results. However, we have noticed a minor adjustment needed for even better performance.
Emily W. –
The C Series CVD/CVI System is truly impressive with its advanced technology for chemical vapor deposition and infiltration. It has greatly improved our production process.
Lyle –
Tks